| AL110-6 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
High throughput, class 10 compatible, 100% backside inspection |
| AL110-8 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
High throughput, class 10 compatible, 100% backside inspection |
| VMR-C4540 |
|
Nikon Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
FOUP, FOSB, OC compatible carriers, episcopic, diascopic, darkfield |
| AL110-86 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
High throughput, class 10 compatible, 100% backside inspection |
| MX61 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
Space saving, ergonomic design, ready for digital imaging |
| MX51 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
Fast, accurate detection of defects, motorized nosepiece available |
| Optistation-3200 |
|
Nikon Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
Optional defect review station, high N.A. w/ longer working distances |
| MX61L |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
Space saving, ergonomic design, ready for digital imaging |
| AL110-5 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
High throughput, class 10 compatible, 100% backside inspection |
| AL110-4 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
High throughput, class 10 compatible, 100% backside inspection |
| Optistation 7 IC |
|
Nikon Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
Dual feeder arm transfer unit offers high throughput, non-contact alignment |
| Optistation-3100 |
|
Nikon Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
Easy operation, contamination free wafer inspection system |
| MX80 |
|
Olympus Surgical & Industrial America, Inc.
|
Wafer and Thin Film Instrumentation
|
Vibration resistant, sealed drive unit, precise laser tracking auto focus |
| Optistation V |
|
Nikon Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
Flexible design, allows for open cassette or SMIF applications |
| EX-3600 |
|
Jordan Valley APD
|
Wafer and Thin Film Instrumentation
|
Determines elements from Fluorine through Uranium |
| CRTS-0 |
|
ULVAC Technologies, Inc.
|
Wafer and Thin Film Instrumentation
|
Sensor with no water cooling pipe jacket |
| NewView 7300 |
|
Zygo Corporation
|
Wafer and Thin Film Instrumentation
|
Excellent precision and accuracy |
| FTM6/7 |
|
Edwards Vacuum
|
Wafer and Thin Film Instrumentation
|
0.0 nm - 999.9 ?m, particularly suitable for use with small coating systems |
| Proforma™ 300 |
|
MTI Instruments Inc.
|
Wafer and Thin Film Instrumentation
|
Wafer/part size (mm): 50, 75, 100, 125, 150, 200, 300 |
| CRTM-9000 |
|
ULVAC Technologies, Inc.
|
Wafer and Thin Film Instrumentation
|
High resolution, long life span, flexible deposition program |
